Micro-nano processing of high precision $ \Omega $ type radiation structure

Journal Information

J. Hefei Univ. Tech. (Nat. Sci.), Dec.2024, Vol.47 No.12: 1642-1647

DOI: 10.3969/j.issn.1003-5060.2024.12.009

Authors

WANG Xinran $ ^{1} $, XU Nanyang $ ^{2,3} $, MA Yu $ ^{2} $, YU Zhifei $ ^{2} $

(1. School of Microelectronics, Hefei University of Technology, Hefei 230601, China; 2. School of Physics, Hefei University of Technology, Hefei 230601, China; 3. Research Center for Quantum Sensing, Zhejiang Lab, Hangzhou 311500, China)

Abstract and Keywords

Abstract: The uniformity and accuracy of microwave radiation structure are the direct factors affecting the sensitivity of diamond solid-state spin quantum state control experiments, so it is particularly important to prepare microwave radiation structure with high precision and good uniformity by micro-nano processing. Based on the simulation of CST MWS software $ \Omega $ slotline model, this paper proposes a new micro-nano processing flow through optical exposure and magnetron sputtering micro-nano processing method to complete the physical preparation with high precision pattern size and dense and uniform metal layer radiation structure. The radiation structure has been verified by quantum regulation of Rabi oscillation experiment. In the experiment, under the condition that the input current power is about 1 W, Rabi oscillation with a frequency of about 14.2 MHz appears at the frequency point of 2.8 GHz, and the radiation structure generates an alternating magnetic field with an effective size of about $ 7.17 \times 10^{-4} $ T along the projection direction of the section plane of the NV axis. Compared with the traditional electrochemical copper plating method, the micro-nano processing proposed in this paper can greatly reduce the step flow, effectively improve the graphic accuracy and uniformity of radiation structure, and better meet the needs of quantum precision measurement experiments.

Keywords: radiation structure; NV center; micro-nano processing; optical exposure; magnetron sputtering

作者信息

王欣然 $ ^{1} $，徐南阳 $ ^{2,3} $，马钰 $ ^{2} $，于志飞 $ ^{2} $

（1. 合肥工业大学微电子学院，安徽合肥 230601；2. 合肥工业大学物理学院，安徽合肥 230601；3. 之江实验室量子传感研究中心，浙江杭州 311500）

摘要和关键词

摘要: 微波辐射结构的均匀性以及精度是影响金刚石固态自旋量子态调控实验灵敏度的直接因素, 因此利用微纳工艺制备出高精度、均匀性良好的微波辐射结构显得尤为重要。文章提出一种新的微纳加工流程, 基于 CST MWS 软件 $ \Omega $ 槽线模型仿真, 通过光学曝光和磁控溅射微纳工艺方法完成具有高精度图形尺寸和致密均匀金属层辐射结构的实物制备。该辐射结构在量子调控 Rabi 振荡实验得到验证。实验中在输入约为 1 W 电流功率的条件下, 在 2.8 GHz 频点处出现频率约为 14.2 MHz 的 Rabi 振荡现象, 辐射结构沿着 NV 轴切面投影方向产生大小约 $ 7.17 \times 10^{-4} $ T 的有效交变磁场。该文提出的微纳工艺流程相比于传统的电化学镀铜方法, 能较大幅度地缩减步骤流程, 有效地提升辐射结构的图形精度和均匀性, 更加契合量子精密测量实验需求。

关键词: 辐射结构；NV色心；微纳加工；光学曝光；磁控溅射

Funding

国家自然科学基金重点培育资助项目（92265114）

合肥工业大学学报(自然科学版)

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